Paper Review Records
All Paper Review Records
19 valid samples · Newest publication first
Review days = acceptance date − received date. PDF, DOI, and publisher-page sources are retained.
135
days
Precise evaluation of silicided source/drain contacts using the bridge-contact resistance method
Authors
Seunggyu Hwang; Bogeun Son; Hyunjung Lee; Jiyeong Yun; Honghwi Park; Hongsik ParkShow moreShow less
Affiliations
School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, South Korea; Smart Manufacturing Research Center, Gumi Electronics & Information Technology Research Institute (GERI), Gumi-si, Gyeongbuk 39171, South Korea; School of Electronic Engineering, Kumoh National Institute of Technology, Gumi-si, Gyeongbuk 39177, South Korea; School of Electronics Engineering, Kyungpook National University, Daegu 41566, South KoreaShow moreShow less
126
days
Interface-activated SrBiO₃/rGO nanoplatform for non-enzymatic electrochemical glucose detection
Authors
Zarmeem Fatima; Meznah M. Alanazi; Shaimaa A.M. Abdelmohsen; Hussain Sawwan; Waqas Ul Arifein; Abhinav Kumar; Reda A. HaggamShow moreShow less
Affiliations
Department of Physics, Government Graduate College, Taunsa Sharif 32100, Pakistan; Department of Physics, College of Science, Princess Nourah bint Abdulrahman University, P.O. Box 84428, Riyadh 11671, Saudi Arabia; Department of Chemical Engineering, College of Engineering, King Khalid University, Abha 61411, Saudi Arabia; Institute of Southern Punjab, Multan, Pakistan; Department of Mathematical Sciences, Saveetha School of Engineering, SIMATS, Chennai, 602105, Tamilnadu, India; Department of Technical Sciences, Western Caspian University, Baku, Azerbaijan; Department of Mechanical Engineering and Renewable Energy, Technical Engineering College, The Islamic University, Najaf, Iraq; Department of Chemistry, Faculty of Science, Islamic University of Madinah, Madinah 42351, Saudi ArabiaShow moreShow less
104
days
Wide-range characterization of GaN HEMTs and its associated compact modeling procedure
Authors
Salim Dahmani; Cyril Buttay; Bruno Allard; Xuyang Lu; Ke Li; Elhadji Adama Seck; Ali Soltani; Hassan MaherShow moreShow less
Affiliations
INSA Lyon, CNRS, Ecole Centrale de Lyon, Universite Claude Bernard Lyon 1, Ampère, UMR CNRS 5005, 69621 Villeurbanne, France; Power Electronics, Machines and Control Research Institute, University of Nottingham, NG7 2RD Nottingham, UK; Laboratoire Nanotechnologies Nanosystèmes (LN2), CNRS UMI-3463, Institut Interdisciplinaire d’Innovation Technologique (3IT) Université de Sherbrooke, Sherbrooke, CanadaShow moreShow less
324
days
Wire resistance impact and compensation methods in analog switching 1R memristive crossbar arrays
Authors
Eter Mgeladze; Po Yuen Ho; Richard Schroedter; Ronald Tetzlaff; Thomas Mikolajick; Stefan SlesazeckShow moreShow less
Affiliations
Namlab gGmbH, Dresden, Germany; Chair of Fundamentals of Electrical Engineering at the TU Dresden, Dresden, Germany; Chair of Nanoelectronics at the TU Dresden, Dresden, GermanyShow moreShow less
46
days
Metal-insulator-semiconductor diodes based on solution-processed ZrO2 and ZnO thin films fabricated on plastic substrates
Authors
Ovier Obregon; David Barba; Miguel A. DominguezShow moreShow less
Affiliations
Centro de Investigaciones en Dispositivos Semiconductores, Instituto de Ciencias, Benemérita Universidad Autónoma de Puebla (BUAP), Puebla 72570, Mexico; Institut National de la Recherche Scientifique, Varennes, QC J3X 1P7, CanadaShow moreShow less
85
days
Bonding of micro LEDs using wet reflow process of indium bumps based on SU-8 solder mask
Authors
Shuangjia Bai; Taifu Lang; Xin Lin; Shuaishuai Wang; Zhihua Wang; Chang Lin; Qun Yan; Jie SunShow moreShow less
Affiliations
Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, and College of Physics and Information Engineering, Fuzhou University, Fuzhou 350100, China; Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 350100, China; Quantum Device Physics Laboratory, Department of Microtechnology and Nanoscience, Chalmers University of Technology, Gothenburg 41296, SwedenShow moreShow less
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